fig1

Microstructural origin of dual band emission and thermal dynamics in suspended silicon-on-insulator infrared sources

Figure 1. Schematic of the proposed MEMS infrared-light-source chip. (A) 3D model; (B) Cross-sectional view along the A-A plane; (C) Equivalent circuit diagram illustrating the working principle of the MEMS-based suspended membrane infrared-light-source chip; (D) Atomic distribution map of boron ion implantation; (E) Schematic of Si-B bond formation after annealing; (F) Atomic-level schematic of electrothermal radiation in B-doped polycrystalline silicon.

Microstructures
ISSN 2770-2995 (Online)

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Portico

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https://www.portico.org/publishers/oae/